Cluster Systems

Not every kind of layer system can be realized in a vacuum chamber. In order to perform complex tasks coating with PVD and CVD processes, we developed a multi-chamber-conditioning system. In its individual vacuum chambers, a plurality of coating processes such as sputtering, electron beam evaporation, thermal evaporation, plasma CVD method can be integrated. A special x-ray-proof chamber design allows the use of electron beam evaporators at high accelerating voltages.

Our cluster system CREAMET 350^® Cl6 can have up to six process chambers and a central chamber with additional integrated storage handling and metering stations.

For further questions, please contact Dr. Steffen Heicke at heicke@creavac.de.